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1. Field of the Invention
The present invention relates to an optical control apparatus which controls light irradiation on a specimen.
2. Description of the Related Art
In recent years, a patterning technique has become more important as an important process in the manufacturing of a semiconductor device. With the patterning technique, a fine pattern can be formed by using a lithography technique and the like. A photo resist for forming a fine pattern is exposed to light for a predetermined period of time. The light irradiation time is controlled to give a predetermined exposure dose. By developing the photo resist, a fine pattern can be formed. It is necessary to control the time of exposure, that be359ba680
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